This is a system that can directly irradiate a photosensitive film with ultraviolet radiation to induce a reaction. It can project a mask shape on a wide variety of substrates at a 1:1 ratio. Through close contact between the mask and substrate, minimum line width of 1μm, and when it comes to repeating the thin film deposition and etching process, alignment with the mask is made possible using a high-magnification dual microscope.
1. Sample size: ~ 6 inch
2. Mask size: 7 x 7 inch
3. Dual CCD zoom microscope and LCD (19-inch) monitor
- Manufacture of electronic, optical and nano devise
- Photolithography
- Application of photosensitive materials
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